CMP Slurry Filtration

Designed to prevent defect-causing agglomerate gels from reaching the wafer surface  

Point-of-Use (POU) and Bulk CMP filters enable process advancements to address two key end-user needs: reduce defects and improve cost of ownership (COO).

Entegris provides a full line of CMP slurry filters for Point-of-Tool (POT), Point-of-Dispense (POD) and bulk/facility applications.